Agenda

Plasma Workshop

Workshop Overview

April 08, 2019 - 11:00

Aim: To learn about understanding and supervision of plasma processes in a manufacturing environment. Experts from the industry and plasma sensor suppliers share their know-how on using and process simulations  and plasma sensors in a manufacturing environment or present open issues.
The use of plasma process models and complementary plasma sensors supports better fault detection and is often mandatory for effective fault classification. Rapid chamber conditioning and chamber matching are also highlighted during this workshop.

    Michael Klick

    Introduction and moderation

    • Michael Klick is CEO of the Plasmetrex GmbH a plasma process control solution provider.
    • He got a diploma for technology of electronic devices in 1987 and a Ph.D. in plasma physics from Ernst-Moritz-Arndt-University Greifswald in 1992.
    • He has more the 15 yeas experience in nonlinear modeling of industrial RF Plasmas and development of plasma sensor systems for etch and deposition in semiconductor and PV manufacturing. He hold several patents in this area.
    • He has been working on the qualification of Process and Maintenance Personnel since 2003 and gives regular lessons at the for student about industrial plasma technology at the Ruhr-University Bochum.
    • Assessment, modeling, and RF and plasma chamber matching for plasma tools in manufacturing are the current key activities.

    AGENDA

    Introduction and moderation:
    Michael Klick | Plasmetrex GmbH

    Main Talks:

    NVLS Concept Sequel: Sensors to Control Tool  Weaknesses
    Dennis Föh | Micronas-TDK

    Towards Digital Twin - Models and Sensors for Plasma Based Semiconductor Process Equipment
    Hemant Mungekar | Applied Materials