| Title |
Presenter |
Company |
| #41 Application of Self-starting Multivariate Control Charts to a Dry Etching Process |
Alice Guerini |
University of Pavia, Italy |
| #42 Monitoring power efficiency to track parts consumption and improve chamber matching in plasma etch chambers |
Maurizio Henin |
STMicroelectronics |
| #46 FDC on Plasma Etch Tools – Recipe Independent Monitoring by Normalization |
Günter Hayderer |
ams AG |
| #37 Dynamic sampling of oxide thickness measurements for DNZ thickness measurement in vertical diffusion tubes |
Michael Bauer |
Texas Instruments Deutschland |
| #50 State validation for EWMA based R2R controllers |
Ulf Seidel |
Infineon Technologies Dresden |
| #55 Enhancements of FDC Systems for legacy fabs |
Andreas Feustel |
Robert Bosch GmbH |
| #48 Wet bench throughput improvements through modelling |
Bas de Kruif |
TNO |
| #53 Simulations of the Transportation System in the Photolithography-Bay at the IFD 300mm-Fab |
Germar Schneider |
Infineon Technologies Dresden GmbH |
| #56 Chlorosilane monitoring system for an Epitaxy Plant |
Daniele Lavalle |
Techno Fittings |
| #70 Pulled forecast out in semiconductor factory |
Margherita Pero |
Politecnico di Milano |
| #73 Analysis and Prediction of FAB's Work in Process |
Boaz Lerner |
Ben-Gurion University |
| #36 Germanys` orientation towards functional production IT – a new paradigm for upcoming APC Solutions |
Konstantin Konrad |
Fraunhofer IPA |
| #57 Yield Improvement in legacy semiconductor manufacturing lines with modular process control and mobile devices |
Jochen Kinauer |
AIS Automation Dresden GmbH |
| #62 Multiple output parameter optimization by a combined random-search, steepest gradient algorithm |
Wolfgang Weiss |
Texas Instruments Deutschland GmbH |
| #80 The Causal Analysis of Product Faults in a Semiconductor Manufacturing Line Using a Data Mining Approach |
Chang Ouk Kim |
Yonsei University |
| #82 Adaptive Fault Detection and Classification Model Based on Decision Tree Learning with Structural Signal Features |
Chang Ouk Kim |
Yonsei University |
| #88 Equipment Health Factor in Photo Lithography |
Gerhard Lippl |
Infineon Technologies Austria |
| #83 In-Situ process control for Atomic Layer Deposition (ALD) |
Johann W. Bartha |
TU Dresden |
