Agenda

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	Foyer – Day 1	South Hall A & B – Day 1	Terrace 2A – Day 1
08.00	Registration 08.00 - 13.00
08.15
08.30
08.45
09.00			Tutorial 1 09.00 - 10.00 Doug Suerich & Michael Arnold \| PEER Group Standardizing the Extraordinary: A SECS/GEM Odyssey
09.15
09.30
09.45
10.00			Coffee Break 10.00 - 10.15
10.15			Tutorial 2 10.15 - 11.45 Doug Suerich & Michael Arnold \| PEER Group Standardizing the Extraordinary: A SECS/GEM Odyssey
10.30
10.45
11.00
11.15
11.30
11.45
12.00
12.15
12.30
12.45
13.00		Opening & Welcome 13.00 - 13.15 Harald Kuhn (Fraunhofer ENAS) & Martin Schellenberger (Fraunhofer IISB) & Jochen Kinauer (Camline)
13.15		Greetings politicians from Saxony and Czech Republic 13.15 - 13.45 Politicians from Saxony and Czech Republic Michal Vavra \| Ministry of Education, Youth and Sports, Czech Republic Lukáš Vlček \| Minister of Industry and Trade of the Czech Republic (tbc.)
13.30
13.45		SSI Keynote 13.45 - 14.15 Volker Herbig \| Xfab
14.00		SSI Keynote 13.45 - 14.15 Volker Herbig \| Xfab
14.15		APC\|M Keynote 14.15 - 14.45 Yvonne Bergmann \| Robert Bosch GmbH & Germar Schneider \| Infineon Technologies GmbH Digitilization and AI as Enabler for a More Stable and Energy- Efficient Manufacturing in Europe APC\|M KeynoteSession chair: Jochen Kinauer
14.30
14.45	Coffee Break 14.45 - 15.15
15.00	Coffee Break 14.45 - 15.15
15.15		SSI Keynote 15.15 - 15.45 Christina Hirschl \| Silicon Austria
15.30
15.45		APC\|M Keynote 15.45 - 16.15 Petr Lenhard \| Inference Technologies Leveraging Manufacturing Data to Predict Latent Reliability Issues in Semiconductors APC\|M KeynoteSession chair: Jochen Kinauer
16.00
16.15		Exhibitor Pitches 16.15 - 16.45 Exhibitor PitchesSession chair: Martin Schellenberger
16.30
16.45	Coffee Break 16.45 - 17.15
17.00	Coffee Break 16.45 - 17.15
17.15		Poster Pitches 17.15 - 18.15
17.30
17.45
18.00
18.15	Poster Reception 18.15 - 19.30
18.30
18.45
19.00
19.15

Foyer – Day 1

Registration
08.00 - 13.00
Coffee Break
14.45 - 15.15
Coffee Break
16.45 - 17.15
Poster Reception
18.15 - 19.30

South Hall A & B – Day 1

Opening & Welcome Harald Kuhn (Fraunhofer ENAS) & Martin Schellenberger (Fraunhofer IISB) & Jochen Kinauer (Camline)
13.00 - 13.15
Greetings politicians from Saxony and Czech Republic Politicians from Saxony and Czech Republic Michal Vavra | Ministry of Education, Youth and Sports, Czech Republic Lukáš Vlček | Minister of Industry and Trade of the Czech Republic (tbc.)
13.15 - 13.45
SSI Keynote Volker Herbig | Xfab
13.45 - 14.15
APC|M Keynote Yvonne Bergmann | Robert Bosch GmbH & Germar Schneider | Infineon Technologies GmbH · Digitilization and AI as Enabler for a More Stable and Energy- Efficient Manufacturing in Europe
14.15 - 14.45
SSI Keynote Christina Hirschl | Silicon Austria
15.15 - 15.45
APC|M Keynote Petr Lenhard | Inference Technologies · Leveraging Manufacturing Data to Predict Latent Reliability Issues in Semiconductors
15.45 - 16.15
Exhibitor Pitches
16.15 - 16.45
Poster Pitches
17.15 - 18.15

Terrace 2A – Day 1

Tutorial 1 Doug Suerich & Michael Arnold | PEER Group · Standardizing the Extraordinary: A SECS/GEM Odyssey
09.00 - 10.00
Coffee Break
10.00 - 10.15
Tutorial 2 Doug Suerich & Michael Arnold | PEER Group · Standardizing the Extraordinary: A SECS/GEM Odyssey
10.15 - 11.45

No agenda slots available!

	Foyer – Day 1	South Hall A & B – Day 1	Terrace 2A – Day 1
08.00	Registration 08.00 - 09.00
08.15
08.30
08.45
09.00		Opening 09.00 - 09.10 Jochen Kinauer & Martin Schellenberger Keynote Talk 09.10 - 10.00 Alan Weber \| Cimetrix by PDF Solutions Digital Twins in Semiconductor Manufacturing: Industry Initiatives and Implementation Insights Keynote TalkSession chair: Martin Schellenberger
09.15
09.30
09.45
10.00		Sponsor Talks 10.00 - 10.30 Inficon, AMAT
10.15		Sponsor Talks 10.00 - 10.30 Inficon, AMAT
10.30	Coffee Break 10.30 - 11.00
10.45	Coffee Break 10.30 - 11.00
11.00		Session 1 - Part 1 11.00 - 11.30 Quentin Parrot \| STMicroelectronics, R8 Rousset Detection of Photolithography Defects by Multivariate GPC Analysis Session 1 - Part 1Session chair: Christian Knöll	Session 2 - Part 1 11.00 - 11.30 Peter Czerner \| Elmos Semiconductor SE Data Scientist in the Age of the AI Revolution Session 2 - Part 1Session chair: Ulf Seidel
11.15
11.30		Session 1 - Part 1 11.30 - 12.00 Jakey Blue \| National Taiwan University Deep Ensembled Incremental Learning Method for Process Drift Detection and Adaptation Session 1 - Part 1Session chair: Christian Knöll	Session 2 - Part 1 11.30 - 12.00 Thomas Bauer \| ams-OSRAM International GmbH Anomaly Detection in XRD diffractograms using AI Autoencoder Session 2 - Part 1Session chair: Ulf Seidel
11.45
12.00	Lunch 12.00 - 13.30 Enjoy your lunch with Onto Innovation!
12.15
12.30
12.45
13.00
13.15
13.30		Session 1 - Part 2 13.30 - 14.00 Kolja Haberland \| LayTec AG Robust and automatic dual wavelength-based endpointing for consistent batch-to-batch plasma etching of InP-based lasers Session 1 - Part 2Session chair: Bert Müller	Session 2 - Part 2 13.30 - 14.00 Fabian Panzer & Martial Baudrier / ams-OSRAM International GmbH Identifying influencing factors for key parameters of pixelated LEDs Session 2 - Part 2Session chair: Alan Weber
13.45
14.00		Session 1 - Part 2 14.00 - 14.30 Michael Klick \| Plasmetrex GmbH Fault Classification for Deep Si Etch Session 1 - Part 2Session chair: Bert Müller	Session 2 - Part 2 14.00 - 14.30 Stephan Zieger \| Fraunhofer ENAS Automating spectral data compression for the Bosch process Session 2 - Part 2Session chair: Alan Weber
14.15
14.30		Session 1 - Part 2 14.30 - 15.00 Juseong Lee & Zimeng Wang \| Eindhoven University of Technology Endpoint detection of plasma etching in small open area based on feature extraction and trend identification Session 1 - Part 2Session chair: Bert Müller	Session 2 - Part 2 14.30 - 15.00 Jon Holt \| PDF Solutions AI Applications for Process Control Session 2 - Part 2Session chair: Alan Weber
14.45
15.00		Session 1 - Part 2 15.00 - 15.30 Jianping Zou \| Applied Materials Inc. A Model Based Method of Non-Threaded R2R Control with Expectation-Maximization (EM) Optimization Session 1 - Part 2Session chair: Bert Müller	Session 2 - Part 2 15.00 - 15.30 Fridolin Schüren \| Fraunhofer ENAS Predicting Material Removal Rate in CMP Processes Using MMD-Based Time Series Embeddings Session 2 - Part 2Session chair: Alan Weber
15.15
15.30	Coffee Break 15.30 - 16.00
15.45	Coffee Break 15.30 - 16.00
16.00		Session 1 - Part 3 16.00 - 16.30 Jan Gräfe \| Kontron AIS GmbH RIDE make tool recipe creation smart Session 1 - Part 3Session chair: Alan Weber	Session 2 - Part 3 16.00 - 16.30 Junsik Choi \| SKKU Prediction of Etch Rate Thickness and Uniformity from End Point Detection Signals of Optical Emission Spectroscopy in Plasma Etching Processes Session 2 - Part 3Session chair: Michael Klick
16.15
16.30		Session 1 - Part 3 16.30 - 17.00 Charlie Sowerby \| INFICON Inc. AI/ML Deployment at the Edge for Run-by-Run and Real-Time Analysis Session 1 - Part 3Session chair: Alan Weber	Session 2 - Part 3 16.30 - 17.00 Jochen Kinauer \| camLine GmbH Overlay Analysis calculator for SPC applications Session 2 - Part 3Session chair: Michael Klick
16.45
17.00			Session 2 - Part 3 17.00 - 17.30 Laurens Borgmann \| SYSTEMA Automating Parametrization with Lot an Equipment Data Session 2 - Part 3Session chair: Michael Klick
17.15
17.30	Break/End of Conference Day 17.30 - 18.00
17.45	Break/End of Conference Day 17.30 - 18.00
18.00	Conference Dinner 18.00 - 22.00 Enjoy the evening with camline!
18.15
18.30
18.45
19.00
19.15
19.30
19.45
20.00
20.15
20.30
20.45
21.00
21.15
21.30
21.45

Foyer – Day 2

Registration
08.00 - 09.00
Coffee Break
10.30 - 11.00
Lunch Enjoy your lunch with Onto Innovation!
12.00 - 13.30
Coffee Break
15.30 - 16.00
Break/End of Conference Day
17.30 - 18.00
Conference Dinner Enjoy the evening with camline!
18.00 - 22.00

South Hall A – Day 2

Opening Jochen Kinauer & Martin Schellenberger
09.00 - 09.10
Keynote Talk Alan Weber | Cimetrix by PDF Solutions · Digital Twins in Semiconductor Manufacturing: Industry Initiatives and Implementation Insights
09.10 - 10.00
Sponsor Talks Inficon, AMAT
10.00 - 10.30
Session 1 - Part 1 Quentin Parrot | STMicroelectronics, R8 Rousset · Detection of Photolithography Defects by Multivariate GPC Analysis
11.00 - 11.30
Session 1 - Part 1 Jakey Blue | National Taiwan University · Deep Ensembled Incremental Learning Method for Process Drift Detection and Adaptation
11.30 - 12.00
Session 1 - Part 2 Kolja Haberland | LayTec AG · Robust and automatic dual wavelength-based endpointing for consistent batch-to-batch plasma etching of InP-based lasers
13.30 - 14.00
Session 1 - Part 2 Michael Klick | Plasmetrex GmbH · Fault Classification for Deep Si Etch
14.00 - 14.30
Session 1 - Part 2 Juseong Lee & Zimeng Wang | Eindhoven University of Technology · Endpoint detection of plasma etching in small open area based on feature extraction and trend identification
14.30 - 15.00
Session 1 - Part 2 Jianping Zou | Applied Materials Inc. · A Model Based Method of Non-Threaded R2R Control with Expectation-Maximization (EM) Optimization
15.00 - 15.30
Session 1 - Part 3 Jan Gräfe | Kontron AIS GmbH · RIDE make tool recipe creation smart
16.00 - 16.30
Session 1 - Part 3 Charlie Sowerby | INFICON Inc. · AI/ML Deployment at the Edge for Run-by-Run and Real-Time Analysis
16.30 - 17.00

Terrace 2A – Day 2

Session 2 - Part 1 Peter Czerner | Elmos Semiconductor SE · Data Scientist in the Age of the AI Revolution
11.00 - 11.30
Session 2 - Part 1 Thomas Bauer | ams-OSRAM International GmbH · Anomaly Detection in XRD diffractograms using AI Autoencoder
11.30 - 12.00
Session 2 - Part 2 Fabian Panzer & Martial Baudrier / ams-OSRAM International GmbH · Identifying influencing factors for key parameters of pixelated LEDs
13.30 - 14.00
Session 2 - Part 2 Stephan Zieger | Fraunhofer ENAS · Automating spectral data compression for the Bosch process
14.00 - 14.30
Session 2 - Part 2 Jon Holt | PDF Solutions · AI Applications for Process Control
14.30 - 15.00
Session 2 - Part 2 Fridolin Schüren | Fraunhofer ENAS · Predicting Material Removal Rate in CMP Processes Using MMD-Based Time Series Embeddings
15.00 - 15.30
Session 2 - Part 3 Junsik Choi | SKKU · Prediction of Etch Rate Thickness and Uniformity from End Point Detection Signals of Optical Emission Spectroscopy in Plasma Etching Processes
16.00 - 16.30
Session 2 - Part 3 Jochen Kinauer | camLine GmbH · Overlay Analysis calculator for SPC applications
16.30 - 17.00
Session 2 - Part 3 Laurens Borgmann | SYSTEMA · Automating Parametrization with Lot an Equipment Data
17.00 - 17.30

No agenda slots available!

	Foyer – Day 1	South Hall A & B – Day 1	Terrace 2A – Day 1
09.00		Opening 09.00 - 09.10 Jochen Kinauer & Martin Schellenberger Keynote Talk 09.10 - 09.40 Doug Suerich \| PEER Group An Industry Plan for Cybersecurity Keynote TalkSession chair: Jochen Kinauer
09.15
09.30
10.00	Coffee Break 10.00 - 10.30
10.15	Coffee Break 10.00 - 10.30
10.30		Session 2 - Part 4 10.30 - 11.00 Silke Braun & Dr. Michael Schmeja \| Infineon Technologies Contributing to a Facility Management 5.0 in Semiconductor Industries Session 2 - Part 4Session chair: Christoph Hohle	Session 3 - Part 1 10.30 - 11.00 Sören Gräßner \| X-FAB GmbH Reticle Scheduling – The unknown friend of Lithography Session 3 - Part 1Session chair: Jochen Kinauer
10.45
11.00		Session 2 - Part 4 11.00 - 11.30 Wes Smith \| Galaxy Semiconductor Prequisites for a Successful Machine Learning Project Session 2 - Part 4Session chair: Christoph Hohle	Session 3 - Part 1 11.00 - 11.30 Anna Ryabokon \| Infineon KI-basierte Harmonisierung von Halbleiter-Prozessen im Infineon One Virtual Fab Cluster Session 3 - Part 1Session chair: Jochen Kinauer
11.15
11.30		Session 2 - Part 4 11.30 - 12.00 Alan Weber \| Cimetrix by PDF Solutions Analysis Tools and Techniques for Smart Manufacturing Citizen Data Scientists Session 2 - Part 4Session chair: Christoph Hohle	Session 3 - Part 1 11.30 - 12.00 Holland Smith \| INFICON Maximum Happiness or Minimum Disappointment: The Science (and Politics) of Applying Multi-objective Optimization (MOOP) in Semiconductor Factory Scheduling Session 3 - Part 1Session chair: Jochen Kinauer
11.45
12.00	Lunch 12.00 - 13.30 Enjoy your lunch with Onto Innovation!
12.15
12.30
12.45
13.00
13.15
13.30		Session 2 - Part 5 13.30 - 14.00 Monica McDonnell & Danesha Marasighe \| Teradata Scaling Machine Learning for Global Demand Forecasting Session 2 - Part 5Session chair: Ulf Seidel	Session 3 - Part 2 13.30 - 14.00 Philipp Schwarz \| ams-OSRAM International GmbH Explaining Energy Peaks in Semiconductor Manufacturing Plants Session 3 - Part 2Session chair: Gerd Fischer
13.45
14.00		Session 2 - Part 5 14.00 - 14.30 Mark Gorman \| Seagate Smart Qual: Tool Health Measures Derived from Equipment Sensors to Facilitate the Reduction of Scheduled Qualification Wafers Session 2 - Part 5Session chair: Ulf Seidel	Session 3 - Part 2 14.00 - 14.30 Robert McCafferty \| RHM Consulting View From Another Industry... Recipe for Greenhouse Gas Reduction in Chemical Manufacturing Session 3 - Part 2Session chair: Gerd Fischer
14.15
14.30		Session 2 - Part 5 14.30 - 15.00 Charlotte Lotze \| Systema Same same but different? Evaluating advanced scheduling methods for lithography production Session 2 - Part 5Session chair: Ulf Seidel	Session 3 - Part 2 14.30 - 15.00 Sebastian Knopp \| Planimize SAS A generic multi-objective optimization software for real-time scheduling Session 3 - Part 2Session chair: Gerd Fischer
14.45
15.00		Session 2 - Part 5 15.00 - 15.30 Malek Atwan \| Fraunhofer ENAS FAME: An Open-Source Data Platform for Exploring Metrology Files and More Session 2 - Part 5Session chair: Ulf Seidel	Session 3 - Part 2 15.00 - 15.30 Antonio Costa \| University of Catania Deep reinforcement learning for lot/batch dispatching in the cleaning-diffusion work area Session 3 - Part 2Session chair: Gerd Fischer
15.15
15.30		Award Ceremony & Closing 15.30 - 16.00 Martin Schellenberger (Fraunhofer IISB) & Jochen Kinauer (Camline)
15.45

Foyer – Day 3

Coffee Break
10.00 - 10.30
Lunch Enjoy your lunch with Onto Innovation!
12.00 - 13.30

South Hall A – Day 3

Opening Jochen Kinauer & Martin Schellenberger
09.00 - 09.10
Keynote Talk Doug Suerich | PEER Group · An Industry Plan for Cybersecurity
09.10 - 09.40
Session 2 - Part 4 Silke Braun & Dr. Michael Schmeja | Infineon Technologies · Contributing to a Facility Management 5.0 in Semiconductor Industries
10.30 - 11.00
Session 2 - Part 4 Wes Smith | Galaxy Semiconductor · Prequisites for a Successful Machine Learning Project
11.00 - 11.30
Session 2 - Part 4 Alan Weber | Cimetrix by PDF Solutions · Analysis Tools and Techniques for Smart Manufacturing Citizen Data Scientists
11.30 - 12.00
Session 2 - Part 5 Monica McDonnell & Danesha Marasighe | Teradata · Scaling Machine Learning for Global Demand Forecasting
13.30 - 14.00
Session 2 - Part 5 Mark Gorman | Seagate · Smart Qual: Tool Health Measures Derived from Equipment Sensors to Facilitate the Reduction of Scheduled Qualification Wafers
14.00 - 14.30
Session 2 - Part 5 Charlotte Lotze | Systema · Same same but different? Evaluating advanced scheduling methods for lithography production
14.30 - 15.00
Session 2 - Part 5 Malek Atwan | Fraunhofer ENAS · FAME: An Open-Source Data Platform for Exploring Metrology Files and More
15.00 - 15.30
Award Ceremony & Closing Martin Schellenberger (Fraunhofer IISB) & Jochen Kinauer (Camline)
15.30 - 16.00

Terrace 2A – Day 3

Session 3 - Part 1 Sören Gräßner | X-FAB GmbH · Reticle Scheduling – The unknown friend of Lithography
10.30 - 11.00
Session 3 - Part 1 Anna Ryabokon | Infineon · KI-basierte Harmonisierung von Halbleiter-Prozessen im Infineon One Virtual Fab Cluster
11.00 - 11.30
Session 3 - Part 1 Holland Smith | INFICON · Maximum Happiness or Minimum Disappointment: The Science (and Politics) of Applying Multi-objective Optimization (MOOP) in Semiconductor Factory Scheduling
11.30 - 12.00
Session 3 - Part 2 Philipp Schwarz | ams-OSRAM International GmbH · Explaining Energy Peaks in Semiconductor Manufacturing Plants
13.30 - 14.00
Session 3 - Part 2 Robert McCafferty | RHM Consulting · View From Another Industry... Recipe for Greenhouse Gas Reduction in Chemical Manufacturing
14.00 - 14.30
Session 3 - Part 2 Sebastian Knopp | Planimize SAS · A generic multi-objective optimization software for real-time scheduling
14.30 - 15.00
Session 3 - Part 2 Antonio Costa | University of Catania · Deep reinforcement learning for lot/batch dispatching in the cleaning-diffusion work area
15.00 - 15.30

No agenda slots available!