Call for Papers
The call for papers is closed. The program is currently being finalized and will soon be available on the homepage.
APC|M TOPICS

Process Level APC
- Plasma etch, CVD and ALD
- Sputtering, P3I, and e--beamLithography
- Thermal, wet processing & CMP
- Backend
- Metrology and R2R
- APC for legacy tools

Fab Level APC
- Digitization, data analytics, machine learning & AI, digital twin
- Fab level process control methods
- Virtual metrology
- Yield management
- Factory data analysis
- IT infrastructure & Equipment integration trends

Manufacturing Effectiveness and Productivity
- Unit process & equipment productivity
- Factory productivity and automation
- Factory modeling, simulation and optimization
- Cost optimization and end-of-life equipment issues
- IT infrastructure & Equipment integration trends
Deadlines
Abstract guidelines and submission
Abstract submission: December 14, 2024
Abstract acceptance: February 14, 2025
Program announcement: February 19, 2025