P101 Pietro Petruzza (presented by Daniele Pagano) | STMicroelectronics
Advanced process control to estimate as accurately as possible the equipment parameters and endpoint trace to detect possible anomalies or drift on equipment process performance
P102 Hanbee Lee | WONIK IPS
An Investigation on Properties of Composite High-k Gate Oxide in 4H-SiC MOS
P103 Josef Lechner | ams-OSRAM AG
Implementation of R2R-controlled Chamber Matching in Via and Metal Etch using HeBSC Pressure
P104 Nina Jäger | ams-OSRAM AG
Prediction of CMP polish time for increased material throughput R2R 2024
P105 Fabian Hovestädt | Robert Bosch Semiconductor Manufacturing Dresden GmbH
Expert system for CMP Control Performance Evaluation
P201 Til Bartel | Ferdinand Braun Institute
Exploring Large Language Models for automated data deconvolution in R&D production environments
P202 Giuseppe Fazio (presented by Daniele Pagano) | STMicroelectronics
SMART devices development to optimize production processes and reduce human errors
P301 Venugopal Ramadasu | Vienna University of Economics and Business (WU)
Improved Production Characterization and Optimization Using Advanced Factory Physics and Machine Learning
