101 |
Sensitivity Enhancement of Optical Signals for Plasma Etching Endpoint Detection with Modified Cluster Analysis Methods |
Seonghyeon Lee |
Sungkyunkwan University |
102 |
An Enhanced Machine Learning Based Hybrid Metrology Approach Enabling APC in Oxide CMP |
Dr. Zhuo Chen |
Onto Innovation |
201 |
Sensor Integration Framework with Interface A |
Bert Müller |
Kontron AIS GmbH |
202 |
Industrialization of statistical methods in form of a preproduction analysis tool |
Valentin Germic |
Elmos Semiconductor AG |
204 |
Use of AI Computer Vision Methods and Edge Intel Industry 4.0 Framework in the Final Quality Control of Manufactured Kontron Industrial Computer |
Maik Pertermann |
Kontron-AIS GmbH |
205 |
Towards the knowledge reuse in the semiconductor manufacturing industry AI Approaches: pitfall and tips |
Houssam Razouk |
Infineon Technologies Austria AG/Graz University of Technology |
301 |
Control of hybrid AMHS considering dynamic transport load transfers between vehicles |
Patrick Boden |
Technische Universität Dresden |
302 |
Smart Sensor Networks for Predictive Maintenance |
Dr. Sebastian Rank |
Technische Universität Dresden |
303 |
Interface Optimization Potentials Concerning Disruptions along the Semiconductor Value Chain |
Fabian Lindner |
Hochschule Zittau/Görlitz |