Session chair: Michael Klick
Company: Junsik Choi | SKKU
Title: Prediction of Etch Rate Thickness and Uniformity from End Point Detection Signals of Optical Emission Spectroscopy in Plasma Etching Processes
Company: Jochen Kinauer | camLine GmbH
Title: Overlay Analysis calculator for SPC applications
Company: Laurens Borgmann | SYSTEMA
Title: Automating Parametrization with Lot an Equipment Data
Session sponsored by:
